wfmpsf

  使用zernike多项式进行光学像差的拟合，从而进行光学镜面像差的分析，有助于提高光学系统的加工精度。(The Zernike polynomial is used to fit the optical aberration, and the analysis of optical mirror aberration is helpful to improve the machining precision of the optical system.)

__MACOSX\wfmpsf\._.DS_Store, 82, 2011-06-24
__MACOSX\wfmpsf\._cmap_fire.mat, 82, 2011-06-24
__MACOSX\wfmpsf\._license.txt, 302, 2011-06-24
__MACOSX\wfmpsf\._maxintensityproj.m, 171, 2011-06-24
__MACOSX\wfmpsf\._readme.txt, 82, 2011-06-24
__MACOSX\wfmpsf\._wfmpsf.m, 171, 2011-06-24
wfmpsf\.DS_Store, 6148, 2011-06-24
wfmpsf\cmap_fire.mat, 1366, 2011-06-24
wfmpsf\maxintensityproj.m, 2215, 2011-06-24
wfmpsf\readme.txt, 28864, 2011-06-24
wfmpsf\results\DL_PSF.jpg, 19147, 2011-06-24
wfmpsf\results\SA_PSF.jpg, 72340, 2011-06-24
wfmpsf\wfmpsf.m, 7982, 2011-06-24
license.txt, 1320, 2014-02-12