登录
首页 » Fortran » vumat

vumat

于 2019-06-13 发布
0 233
下载积分: 1 下载次数: 17

代码说明:

说明:  vumat 本构模型,von mises屈服准则加各向同性硬化准则(vumat von mises constitutive model+isotropic hardening)

文件列表:

20190605-eg7.for, 10280 , 2019-06-04

下载说明:请别用迅雷下载,失败请重下,重下不扣分!

发表评论

0 个回复

  • MyGame
    打怪游戏源代码。C#编写,VS平台,多线程,(rew tretrer trewtrc ewrewewtr retewt erwfrewr)
    2009-12-04 16:56:03下载
    积分:1
  • WebSite1
    说明:  水晶报表 导出excel格式 包含网格线(Crystal report export excel format containing grid)
    2008-10-10 15:47:18下载
    积分:1
  • 逍遥西游修改通用资源
    说明:  逍遥西游200多个更改路径以及修复文档,客户端修复文档,服务端修复文档(More than 200 change paths and repair documents, client repair documents and server repair documents of Xiaoyao westward Tour)
    2020-04-01 13:23:45下载
    积分:1
  • FFT_fix_h0
    可以计算固定共振腔高度的互阻抗,超材料研究(Calculate acoustic impedance with fixed height)
    2020-06-17 22:00:01下载
    积分:1
  • double_control
    说明:  采用电压外环电流内环,双环PI控制三相并联BUCK电路。(Voltage outer loop current inner loop, double loop PI control three-phase parallel BUCK circuit.)
    2020-02-09 19:35:25下载
    积分:1
  • emd-lstm
    说明:  基于经验模态分解成多个模态和一个残余量,再利用长短神经网络预测分别训练每一个模态和残余量,最后重构结果,得到预测结果(Prediction based on empirical mode decomposition and long short neural network)
    2020-06-29 14:40:02下载
    积分:1
  • 清除系统垃圾,不占用内存、空间,方便使用,比优化大师好,本人已使用很长时间。...
    清除系统垃圾,不占用内存、空间,方便使用,比优化大师好,本人已使用很长时间。-Garbage removal system, not memory, space, user-friendly, better than the optimization of the master, I have been using for a long time.
    2022-09-21 09:00:03下载
    积分:1
  • 422
    说明:  422发送源码,目前使用的是20m时钟计算出来的波特率,后期可以根据自己的需要进行修改波特率时期匹配各种情况(422 sends the source code. At present, the baud rate calculated by 20m clock is used. Later, you can modify the baud rate according to your own needs to match various situations)
    2021-04-07 15:29:01下载
    积分:1
  • 一些LabVIEW的源代码
    some labview source code
    2023-04-28 03:50:03下载
    积分:1
  • we
    说明:  】《微电子制造科学原理与工程技术》(第二版),作者:(美)Stephen A.Campbell。本书系统地介绍了微电子制造科学原理与工程技术,覆盖了集成电路制造所涉及的所有基本单项工艺,包括光刻、等离子体和反应离子刻蚀、离子注入、扩散、氧化、蒸发、气相外延生长、溅射和化学气相淀积等。对每一种单项工艺,不仅介绍了它的物理和化学原理,还描述了用于集成电路制造的工艺设备(】 &quot Microelectronics manufacturing science and engineering principles&quot (second edition), on: (United States) Stephen A. Campbell. This book introduces the principles of microelectronics manufacturing science and engineering technology, IC manufacturing involves covering all the basic individual techniques, including photolithography, plasma and reactive ion etching, ion implantation, diffusion, oxidation, evaporation, gas epitaxial growth, sputtering and chemical vapor deposition, etc.. For each individual process, not only describes its physical and chemical principles, but also describes the process used in integrated circuit manufacturing equipment)
    2010-04-06 19:42:44下载
    积分:1
  • 696516资源总数
  • 106914会员总数
  • 0今日下载